5nm design issue

shsoc

   

yitengzeng 发表于 2019-5-21 09:20
because same layer have double pattern DRC that means layer metal made by different mask. But EUV on ...

so when EUV is involved, the need of double pattern will dispeared, right?

yitengzeng

   

shsoc 发表于 2019-5-21 10:50
so when EUV is involved, the need of double pattern will dispeared, right?

Maybe not all layer