5nm design issue

shsoc · 发表于 2019-5-16 10:38:37

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who knows the issues about the design chanllenges at 5nm and below?
Maybe the double pattern will disapared because of the EUV involved?

shsoc · 发表于 2019-5-16 10:40:19

and the color will disapared also

shsoc · 发表于 2019-5-16 10:40:54

but will electrical check are big issues?

shsoc · 发表于 2019-5-16 10:41:56

and will EM and IR-drop are big issues?

shsoc · 发表于 2019-5-16 10:42:41

Does anyone interest?

runforbetter · 发表于 2019-5-16 18:04:53

因崔斯汀

shsoc · 发表于 2019-5-17 15:03:33

Does the double pattern will disapared

shsoc · 发表于 2019-5-17 15:04:05

upupup

shsoc · 发表于 2019-5-20 10:22:49

maybe there is someone insterst

yitengzeng · 发表于 2019-5-21 09:20:13

because same layer have double pattern DRC that means layer metal made by different mask. But EUV only need one mask to make layer metal

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[讨论] 5nm design issue