Case of Photo mask defects induced wafer lithography defect

copper_hou · 发表于 2023-11-29 17:16:10

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CD defects of 100nm pattern space (corresponds to 25nm) of photomask induced wafer lithography defects.

Pattern defects of Photo Mask cause wafer litho defect.jpg

Pattern defects of Photo Mask cause wafer litho defect.jpg

Wafer Fabs of 65nm technology or below must pay the effective investment to protect their expensive and presice tool-photo mask for high production yields.

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[资料] Case of Photo mask defects induced wafer lithography defect

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